Ultraviolet femtosecond pulses: Key technology for sub-micron machining and efficient XUV pulse generation

نویسندگان

  • p. simon
  • j. bekesi
  • c. dölle
  • j. - h. klein - wiele
  • g. marowsky
  • s. szatmari
  • b. wellegehausen
چکیده

A new scheme to increase the extractable energy from a table-top KrF amplifier up to 100 mJ/pulse is presented. Applications of such pulses for micro-machining and for the generation of powerful XUV radiation are demonstrated. PACS 42.60.Da; 42.65.Ky; 81.40.-z

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تاریخ انتشار 2002